[1] Kawagachi Yoshizo, Sato Tadatake, Narazaki Aiko et al.. Etching a microtrench with a maximum aspect ratio of 60 on silica glass by laserinduced backside wet etching[J]. Japanese J. Applied Physics, Part 2: Letters, 2005, 44(1~7): L176~L178
[2] L. W. Hrubesh, M. A. Norton, W. A. Molander et al.. Chemical etch effects on laserinduced surface damage growth in fused silica[C]. Proc. SPIE, 2001, 4347: 553~559
[3] Elin Steinsland, Terje Finstad, Anders Hanneberg et al.. Etch rates of (100), (111) and (110) singlecrystal silicon in TMAH measured in situ by laser reflectance interferometry[J]. Sensors and Actuators, A: Physical, 2000, 86(1~2): 73~80
[4] T. Oishi, M. Goto, Y. Pihosh et al.. Silicon microstructure fabricated by laser micropatterning method combined with wet etching process[J]. Appl. Sur. Sci., 2005, 241(1~2): 223~226
[5] Yokouchi Noriyuki, Nanner Aaron. J, Choquette Kent. D et al.. Etching depth dependence of the effective refractive index in twodimensional photoniccrystalpatterned verticalcavity surfaceemitting laser structures[J]. Appl. Phys. Lett., 2003, 82(9): 1344~1346
[6] Lussara Azevedo Manhaes, Denise Cerqueira Oliveira, Marcia Martins Marques et al.. Influence of Er∶YAG laser surface treatment and primer application methods on microtensile bond strength selfetching systems[J]. Photomedicine and Laser Surgery, 2005, 23(3): 304~312
[7] S. Mailis, G. W. Ross, L. Reekie et al.. Fabrication of surface relief gratings on lithium niobate by combined UV laser and wet etching[J]. Electron. Lett., 2000, 36(21): 1801~1803