[1] Zhao L, Liu Q G, Liang F G et al. Development of the micron grating sample and the evaluation of the key quality parameters[J]. Micronanoelectronic Technology, 52, 537-541(2015).
[3] Wu Z R, Cai Y N, Wang X R et al. Amorphous Si critical dimension structures with direct Si lattice calibration[J]. Chinese Physics B, 28, 030601(2019).
[4] Li Y, Lei L H, Gao Q et al. Research of the optical characterization method on the nano dimension standard sample[J]. Micronanoeletronic Technology, 49, 406-412(2012).
[5] Gan M H, Wu W Q, Long Q W. A high-precision automatically method of line width measurement based on image processing[J]. Printed Circuit Information, 19, 66-70(2011).
[6] Bouchara F, Bertrand M, Ramdani S et al. Sub-pixel edge fitting using B-spline[M]. ∥Gagalowicz A, Philips W. Computer vision/computer graphics collaboration techniques. Lecture notes in computer science. Berlin, Heidelberg: Springer, 4418, 353-364(2007).
[7] Hinz S. Fast and subpixel precise blob detection and attribution. [C]∥IEEE International Conference on Image Processing 2005, September 14, 2005, Genova, Italy. New York: IEEE, 8856906(2005).
[8] Dai G L, Hahm K, Bosse H et al. Comparison of line width calibration using critical dimension atomic force microscopes between PTB and NIST[J]. Measurement Science and Technology, 28, 065010(2017).
[9] Dai G L, Zhu F, Heidelmann M et al. Development and characterisation of a new line width reference material[J]. Measurement Science and Technology, 26, 115006(2015).
[10] Hussain D, Ahmad K, Song J M et al. Advances in the atomic force microscopy for critical dimension metrology[J]. Measurement Science and Technology, 28, 012001(2017).
[11] Kramar J A, Dixson R, Orji N G. Scanning probe microscope dimensional metrology at NIST[J]. Measurement Science and Technology, 22, 024001(2011).