• Laser & Optoelectronics Progress
  • Vol. 57, Issue 1, 011201 (2020)
Xiaodong Zhang*, Lin Zhao, Zhiguo Han, Yanan Feng, and Suoyin Li
Author Affiliations
  • The 13th Institute of China Electronics Technology Corporation, Shijiazhuang, Hebei 050051, China
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    DOI: 10.3788/LOP57.011201 Cite this Article Set citation alerts
    Xiaodong Zhang, Lin Zhao, Zhiguo Han, Yanan Feng, Suoyin Li. Line Spacing Measurement Method Based on Image Processing[J]. Laser & Optoelectronics Progress, 2020, 57(1): 011201 Copy Citation Text show less
    Standard line spacing sample with micro-nano size
    Fig. 1. Standard line spacing sample with micro-nano size
    CD-SEM measurement system
    Fig. 2. CD-SEM measurement system
    Sample obtained by CD-SEM
    Fig. 3. Sample obtained by CD-SEM
    Oblique detection method
    Fig. 4. Oblique detection method
    Baseline detection method
    Fig. 5. Baseline detection method
    NMM system
    Fig. 6. NMM system
    Nominalvalue /μmLinear approximationalgorithm /μmLine spacingmeasurementalgorithm /μm
    0.10.09890.0990
    0.20.19890.1991
    0.50.49770.4987
    10.99991.0005
    22.00222.0009
    55.00415.0038
    109.95369.9736
    Table 1. Measurement values of two algorithms
    Nominalvalue /μmMeasurementof NMM /μmRelative error of linearapproximation algorithm /%Relative error of line spacingmeasurement algorithm /%
    0.10.09930.4030.302
    0.20.19960.3510.251
    0.50.49980.4200.220
    110.0100.050
    220.1100.045
    55.0030.0220.016
    109.9990.4540.254
    Table 2. Comparison of measurement results of two algorithms
    Xiaodong Zhang, Lin Zhao, Zhiguo Han, Yanan Feng, Suoyin Li. Line Spacing Measurement Method Based on Image Processing[J]. Laser & Optoelectronics Progress, 2020, 57(1): 011201
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