[1] David Melville, Alan E Rosenbluth, Kehan Tian, et al.. Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations [C]. SPIE, 2010, 7640: 764006.
[2] Jue-Chin Yu, Peichen Yu. Gradient-based fast source mask optimization (SMO) [C]. SPIE, 2011, 7973: 797320.
[3] Charlie Chung Ping Chen, Ahmet Gurhanli, Tse-Yu Chiang, et al.. Abbe singular-value decomposition: compact Abbe′s kernel generation for microlithography aerial image simulation using singular-value decomposition method [J]. J Vacuum Science & Technology B, 2008, 26(6): 2322-2330.
[4] Xu Ma, Yanqiu Li, Xuejia Guo, et al.. Robust resolution enhancement optimization methods to process variations based on vector imaging model [C]. SPIE, 2012, 8326: 83262A.
[6] Andreas Erdmann, Peter Evanschitzky, Peter De Bisschop. Mask and wafer topography effects in immersion lithography [C]. SPIE, 2005, 5754: 383-394.
[7] Peng Liu, Yu Cao, Luoqi Chen, et al.. Fast and accurate 3D mask model for full-chip OPC and verification [C]. SPIE, 2007, 6520: 65200R.
[8] Jue-Chin Yu, Peichen Yu. Fast converging inverse lithography algorithm incorporating image gradient descent methods [C]. SPIE, 2009, 7520: 75200V.
[9] Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao. Source optimization incorporating margin image average with conjugate gradient method [C]. SPIE, 2012, 8326: 83261W.
[10] Linyong Pang, Guangming Xiao, Vikram Tolani, et al.. Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO) [C]. SPIE, 2008, 7122: 71221W.
[11] Jia Li, Shiyuan Liu, Edmund Y Lam. Efficient source and mask optimization with augmented Lagrangian methods in optical lithography [J]. Opt Express, 2013, 21(7): 8076-8090.
[12] Tim Fühner, Andreas Erdmann, Sebastian Seifert. Direct optimization approach for lithographic process conditions [J]. J Micro/Nanolithography, MEMS, and MOEMS, 2007, 6(3): 031006.
[13] Chaoxing Yang, Xiangzhao Wang, Sikun Li, et al.. Source mask optimization using real-coded genetic algorithms [C]. SPIE, 2013, 8683: 86831T.
[14] Sikun Li, Xiangzhao Wang, Yang Bu. Robust pixel-based source and mask optimization for inverse lithography [J]. Optics & Laser Technology, 2012, 45: 285-293.
[15] Gregory McIntyre, Daniel Corliss, Remco Groenendijk, et al.. Qualification, monitoring, and integration into a production environment of the world′s first fully programmable illuminator [C]. SPIE, 2011, 7973: 797306.
[16] Noriyuki Hirayanagi, Yasushi Mizuno, Masakazu Mori, et al.. Illumination pupilgram control using an intelligent illuminator [C]. SPIE, 2013, 8683: 86830D.
[17] Xiao Yanfen, Zhu Jing, Yang Baoxi, et al.. Design of micro-cylindrical-lens array used for illumination uniformization in lithography systems [J]. Chinese J Lasers, 2013, 40(2): 0216001.
[18] Hu Zhonghua, Yang Baoxi, Zhu Jing, et al.. Design of diffractive optical element for pupil shaping optics in projection lithography system [J]. Chinese J Lasers, 2013, 40(6): 0616001.
[20] Ryota Matsui, Tomoya Noda, Hajime Aoyama, et al.. Global source optimization for MEEF and OPE [C]. SPIE, 2013, 8683: 86830O.
[21] A K Wong. Optical Imaging in Projection Microlithography [M]. Bellingham: SPIE, 2005.
[22] Ni Qin. Optimization Method and Program Design [M]. Beijing: Science Press, 2009.
[23] C A Mack. Lithography simulation in semiconductor manufacturing [C]. SPIE, 2005, 5645: 63-83.
[24] T Fühner, T Schnattinger, G Ardelean, et al.. Dr. LiTHO-a development and research lithography simulator [C]. SPIE, 2007, 6520: 65203F.