Laser thermal lithography is a new technique developed in recent years, and is used in a number of areas including the manufacture of sub-wavelength nanostructure devices and high density optical disc mastering. Based on thermal change threshold effect of laser thermal lithography materials, the pattern size less than the optical diffraction limit can be fabricated. The fundamental principle, characteristics and requirements for the laser thermal lithography materials are presented. Then the latest research of the phase-transition laser thermal lithography thin films, including chalcogenide phase-change thin films, metal sub-oxide thin films and ceramics composite thin films, thermal decomposition laser thermal lithography thin films and chemical reaction laser thermal lithography thin films is reviewed. In addition, the thermal lithography mechanism of inorganic laser thermal lithography materials is analyzed and summarized, and the development and prospect of inorganic laser thermal lithography materials are discussed.