Analysis of Influence of Temperature Distribution in Spectral Control of Excimer Lasers for Lithography on Output Spectra

Qian Wang; Jiangshan Zhao; Xin Guo; Yuanyuan Fan; Yi Zhou; Rui Jiang

doi:10.3788/LOP202158.0914003

[1] Stamm U, Kleinschmidt J, Heist P et al. ArF excimer laser for 193-nm lithography[J]. Proceedings of SPIE, 3334, 1010-1013(1998).

[2] Miyamoto H, Furusato H, Ishida K et al. Next-generation ArF laser technologies for multiple-patterning immersion lithography supporting leading edge processes[J]. Proceedings of SPIE, 1058, 1058710(2018).

[3] Basting D, Marowsky G[M]. Excimer laser technology(2005).

[4] Zhang H B, Lou Q H, Zhou J et al. ArF excimer laser line narrowing technique[J]. Laser & Optoelectronics Progress, 46, 46-51(2009).

[5] Barr J R M. Achromatic prism beam expanders[J]. Optics Communications, 51, 41-46(1984).

[6] Loewen E, Maystre D, Popov E et al. Diffraction efficiency of echelles working in extremely high orders[J]. Applied Optics, 35, 1700-1704(1996).

[7] Zhang H B, Yuan Z J, Zhou J et al. Optimal design of prism beam expander in line narrowed excimer laser cavity[J]. Chinese Journal of Lasers, 38, 1102008(2011).

[8] Shan Y Y, Zhao J S, Li H et al. Application study on fused silica prisms in excimer laser spectrum control[J]. Chinese Journal of Lasers, 40, 0402008(2013).

[9] Wang Q, Zhao J S, Zhou Y. Analysis on precision assembly characteristics of prism expander applied to spectrum control[J]. Chinese Journal of Lasers, 45, 0401012(2018).