Ultra-broadband nanowire metamaterial absorber

Baoqing Wang; Cuiping Ma; Peng Yu; Alexander O. Govorov; Hongxing Xu; Wenhao Wang; Lucas V. Besteiro; Zhimin Jing; Peihang Li; Zhiming Wang

doi:10.1364/PRJ.473332

Journals >Photonics Research >Volume 10 >Issue 12 >Page 2718 > Article

Photonics Research
Vol. 10, Issue 12, 2718 (2022)

Ultra-broadband nanowire metamaterial absorber

Baoqing Wang^1、2、†, Cuiping Ma^2、†, Peng Yu^1、6、*, Alexander O. Govorov³, Hongxing Xu⁴, Wenhao Wang², Lucas V. Besteiro⁵, Zhimin Jing², Peihang Li², and Zhiming Wang^2、7、*

Author Affiliations

¹College of Optoelectronic Technology, Chengdu University of Information Technology, Chengdu 610225, China

²Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu 610054, China

³Department of Physics and Astronomy and Nanoscale and Quantum Phenomena Institute, Ohio University, Athens, Ohio 45701, USA

⁴School of Physics and Technology, Center for Nanoscience and Nanotechnology, Wuhan University, Wuhan 430072, China

⁵CINBIO, Universidade de Vigo, Vigo 36310, Spain

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DOI: 10.1364/PRJ.473332 Cite this Article Set citation alerts

Baoqing Wang, Cuiping Ma, Peng Yu, Alexander O. Govorov, Hongxing Xu, Wenhao Wang, Lucas V. Besteiro, Zhimin Jing, Peihang Li, Zhiming Wang. Ultra-broadband nanowire metamaterial absorber[J]. Photonics Research, 2022, 10(12): 2718 Copy Citation Text

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Ultra-broadband plasmonic metamaterial absorber. (a) 3D schematic of the absorber. (b) Front view of the unit cell of the absorber. (c) Typical metamaterial absorber with sandwiched MDM configuration and obtained absorption spectra. The geometric parameters are consistent with model 1. The period of the structure is 220 nm, thickness of the substrate is 300 nm, radius of metal and dielectric is 100 nm, and heights of metal and dielectric are 45 and 25 nm, respectively.

Fig. 1. Ultra-broadband plasmonic metamaterial absorber. (a) 3D schematic of the absorber. (b) Front view of the unit cell of the absorber. (c) Typical metamaterial absorber with sandwiched MDM configuration and obtained absorption spectra. The geometric parameters are consistent with model 1. The period of the structure is 220 nm, thickness of the substrate is 300 nm, radius of metal and dielectric is 100 nm, and heights of metal and dielectric are 45 and 25 nm, respectively.

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Absorption spectra of the proposed absorbers. (a)–(d) Obtained absorption spectra with (red dashed line) or without (dark green solid line) covering a layer of Al2O3 of models 1 to 4. The grey dashed line indicates the standard spectrum of solar radiance AM 1.5.

Fig. 2. Absorption spectra of the proposed absorbers. (a)–(d) Obtained absorption spectra with (red dashed line) or without (dark green solid line) covering a layer of Al2O3 of models 1 to 4. The grey dashed line indicates the standard spectrum of solar radiance AM 1.5.

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Fig. 3. Absorption under different incident conditions. (a) Contour plot of the absorption spectra for TE mode and (b) TM mode at different incident angles from 0° to 70° with a step of 5°. (c) Absorbance spectra with different incident angles for TE mode and (d) TM mode. (e) Average absorption from 0.2 to 7 μm as a function of incident angle with TE and TM modes.

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Fig. 4. Electric field (|E|) distributions (surface plot) and Poynting vectors (white arrows) in a unit cell at different wavelengths, where TM-polarized light with normal incidence is chosen. The upper figures represent the short-wavelength region; lowers are the long-wavelength region. The position of the monitor is located at y=0 nm. The red dashed frame indicates where the light is confined in the absorber.

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Fig. 5. Absorber structure can be considered as a set of G-SPP resonators. (a) Schematic of light propagation in the cross section of the absorber and the resulting resonance mode. (b) G-SPP mode effective index with various dielectric film thicknesses and (c) its propagation lengths as a function of incident wavelengths. (d) Equivalent structure diagram of the absorber section. (e) Required height to maintain FP resonance versus resonance wavelength for different phase shifts. The red dashed line shows the corresponding height in the absorber. (f) Phase shift of the G-SPP in cavity 2. The monitor is placed in the center of the cavity.

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Fig. 6. Absorption spectra with different structure parameters. (a) Period p. (b) Radius of dielectric nanowires r1. (c) Radius of dielectric nanorings r2. (d) Distance between the bottom nanoring and metallic film h1. (e) Height of the nanorings h2. (f) Number of nanorings coated on a nanowire n.

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Fig. 7. Average absorption with different structure parameters. (a) Period p. (b) Radius of dielectric nanowires r1. (c) Radius of dielectric nanorings r2. (d) Distance between the bottom nanoring and metallic film h1. (e) Height of the nanorings h2. (f) Number of nanorings coated on a nanowire n.

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Fig. 8. Magnetic field (|H|) distributions and Pabs (in log scale) in a unit cell at typical wavelengths, where TM-polarized light with normal incidence is chosen. The position of the monitor is located at y=0 nm.

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$Absorption spectra with different structure parameters. (a) Distance between two nanorings h3. (b) Remaining height of dielectric nanowires h4. (c) Refractive index of the dielectric RI.$

Fig. 9. Absorption spectra with different structure parameters. (a) Distance between two nanorings h3. (b) Remaining height of dielectric nanowires h4. (c) Refractive index of the dielectric RI.

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$Average absorption with different structure parameters. (a) Distance between two nanorings h3. (b) Remaining height of dielectric nanowires h4. (c) Refractive index of the dielectric RI.$

Fig. 10. Average absorption with different structure parameters. (a) Distance between two nanorings h3. (b) Remaining height of dielectric nanowires h4. (c) Refractive index of the dielectric RI.

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Absorber	Metal	$p$ (nm)	$r_{1}$ (nm)	$r_{2}$ (nm)	$h_{2}$ (nm)	$h_{3}$ (nm)	$h_{4}$ (nm)	$n$	RI
Model 1	Ti	220	75	100	45	25	360	8	2.5
Model 2	Ti	270	75	115	50	5	185	5	2.5
Model 3	Cr	220	75	100	70	25	245	3	2.2
Model 4	Pd	250	75	100	45	30	110	3	1.8

Table 1. Optimized Geometric Parameters of the Proposed Absorbers

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Structure	Structure Period (μm)	Absorption Bandwidth (μm)	Average Absorption	Scalability to Large Areas	Fabricating Difficulty	Ref.
Four resonators with MDM tri-layers	6.76	7.8–12.1	90%	No	Challenging (sim.)	Guo et al. (2016) [26]
Tapered multilayers	4	0.2–15	$> 90 %$	No	Challenging (sim.)	Yue et al. (2020) [19]
Four resonators with MDM tri-layers	3.72	6.3–14.8	90%	No	Medium (sim.)	Luo et al. (2020) [27]
Three resonators with MDM tri-layers	3.6	4–16	$> 75 %$	No	Low (exp.)	Shrestha et al. (2018) [28]
Embedding the MDM cavity into dielectrics	2.4	8–16	94%	No	Challenging (sim.)	Luo et al. (2019) [29]
Tapered multilayers	1.6	1–14	$> 99 %$	No	Challenging (sim.)	Liang et al. (2013) [18]
MDM tri-layers	1.6	8–14	$> 90 %$	No	Low (exp.)	Zhou et al. (2021) [30]
Gosper curve resonators with MDM tri-layers	1.55	2.64–9.79	95.78%	No	Challenging (sim.)	Zhou et al. (2019) [16]
Five resonators with multilayers	1.4	8–14	$\approx 87.9 %$	No	Low (sim.)	Zhou et al. (2020) [31]
Wire-grid with multilayers	1	1.98–11.74	$> 95 %$	No	Low (exp.)	Zhong et al. (2017) [32]
Tapered multilayers	0.8	2.5–7	86.4%	No	Challenging (sim.)	Cui et al. (2012) [33]
Nanoparticles embedded in nanopores	0.45	0.4–10	99%	Yes	Low (exp.)	Zhou et al. (2016) [20]
This absorber	0.22	0.2–7	$> 91 %$	Yes	Medium (sim.)	This work

Table 2. Comparison of Representative Works on Broadband Absorbers Operating at Least to Mid-Infrared Wavelength^a

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Figure	$p$ (nm)	$r_{1}$ (nm)	$r_{2}$ (nm)	$h_{1}$ (nm)	$h_{2}$ (nm)	$h_{3}$ (nm)	$h_{4}$ (nm)	$n$	RI
Fig. 6(a)	Varied	75	100	0	45	25	360	8	2.5
Fig. 6(b)	220	Varied	100	0	45	25	360	8	2.5
Fig. 6(c)	220	75	Varied	0	45	25	360	8	2.5
Fig. 6(d)	220	75	100	Varied	45	25	360	8	2.5
Fig. 6(e)	220	75	100	0	Varied	25	360	8	2.5
Fig. 6(f)	220	75	100	0	45	25	360	Varied	2.5
Fig. 9(a)	220	75	100	0	45	Varied	360	8	2.5
Fig. 9(b)	220	75	100	0	45	25	Varied	8	2.5
Fig. 9(c)	220	75	100	0	45	25	360	8	Varied