• Acta Photonica Sinica
  • Vol. 50, Issue 9, 0930001 (2021)
Chi CHEN, Chaoyang ZHANG, Wenjie FU, Dun LU, Tongxing HUANG, and Yang YAN
Author Affiliations
  • School of Electronic Science and Engineering and Terahertz Science, University of Electronic Science and Technology of China, Chengdu610054, China
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    DOI: 10.3788/gzxb20215009.0930001 Cite this Article
    Chi CHEN, Chaoyang ZHANG, Wenjie FU, Dun LU, Tongxing HUANG, Yang YAN. Electron Temperature Diagnostics in Microwave Plasma Chemical Vapor Deposition by Optical Emission Spectroscopy[J]. Acta Photonica Sinica, 2021, 50(9): 0930001 Copy Citation Text show less

    Abstract

    The electron temperature of the Ar/CH4 plasma was diagnosed under the pressure of 40~80 Pa and the microwave power of 400~800 W by Optical Emission Spectrometry (OES). The experimental results show that the electron temperature obtained by the OES is between 0.75 eV and 4 eV under the above experimental conditions. Through measurement of Ar or CH4 plasma, it is feasible to use the OES method in microwave coaxial plasma with carbon-containing gas. This research can further expand the application of the OES method in the PECVD field.
    Imn=Ω4πNmAmnhvmnV(1)

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    λmn=cvmn(2)

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    Imn=Ωc4πλmnNmAmnhV(3)

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    Nm=N0gmQ(T)exp-EmkT(4)

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    N1N2=g1g2exp-E1-E2kTe(5)

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    I1I2=N1λ2A1N2λ1A2=g1λ2A1g2λ1A2expE2-E1kTe(6)

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    lnI1λ1A2g2I2λ2A1g1=-E1-E2kTe(7)

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    lnI1λ1A1g1-lnI2λ2A2g2=-E1kTe-E2kTe(8)

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    lnλiIiAigi=-1kTeEi+C(9)

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    Chi CHEN, Chaoyang ZHANG, Wenjie FU, Dun LU, Tongxing HUANG, Yang YAN. Electron Temperature Diagnostics in Microwave Plasma Chemical Vapor Deposition by Optical Emission Spectroscopy[J]. Acta Photonica Sinica, 2021, 50(9): 0930001
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