Self-aligned fiber-based dual-beam source for STED nanolithography

Jian Chen; Guoliang Chen; Qiwen Zhan

doi:10.3788/COL202119.072201

Journals >Chinese Optics Letters >Volume 19 >Issue 7 >Page 072201 > Article

Chinese Optics Letters
Vol. 19, Issue 7, 072201 (2021)

Self-aligned fiber-based dual-beam source for STED nanolithography

Jian Chen, Guoliang Chen, and Qiwen Zhan^*

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School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 201800, China

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DOI: 10.3788/COL202119.072201 Cite this Article Set citation alerts

Jian Chen, Guoliang Chen, Qiwen Zhan. Self-aligned fiber-based dual-beam source for STED nanolithography[J]. Chinese Optics Letters, 2021, 19(7): 072201 Copy Citation Text

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Jian Chen, Guoliang Chen, Qiwen Zhan. Self-aligned fiber-based dual-beam source for STED nanolithography[J]. Chinese Optics Letters, 2021, 19(7): 072201

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