Preparation and application of a high-performance vanadium oxide thermosensitive film

Zhanfeng Ma; Ying Wang; Chao Wang; Fan Ye; Jianfei Gao; Li Huang

doi:10.3788/IRLA20200349

Journals >Infrared and Laser Engineering >Volume 50 >Issue 2 >Page 20200349 > Article

Infrared and Laser Engineering
Vol. 50, Issue 2, 20200349 (2021)

Preparation and application of a high-performance vanadium oxide thermosensitive film

Zhanfeng Ma, Ying Wang, Chao Wang, Fan Ye, Jianfei Gao, and Li Huang

Author Affiliations

Wuhan Guide Infrared Co., Ltd., Wuhan 430205, China

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DOI: 10.3788/IRLA20200349 Cite this Article

Zhanfeng Ma, Ying Wang, Chao Wang, Fan Ye, Jianfei Gao, Li Huang. Preparation and application of a high-performance vanadium oxide thermosensitive film[J]. Infrared and Laser Engineering, 2021, 50(2): 20200349 Copy Citation Text

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Fig. 1. [in Chinese]

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Fig. 2. [in Chinese]

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Fig. 3. [in Chinese]

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Fig. 4. [in Chinese]

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Fig. 5. [in Chinese]

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Condition	Valence of vanadium	Peak area of vanadium/P	Percentage of total	TCR
T1	V⁵⁺	134749.37	59.24%	2.27%
	V⁴⁺	75060.59	32.99%
	V³⁺	17687.09	7.77%
T2	V⁵⁺	151143.03	66.07%	2.69%
	V⁴⁺	35430.81	15.48%
	V³⁺	42235.11	18.45%

Table 1. [in Chinese]

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Sample	T1 Ra/nm	T2 Ra/nm	T1 Rq/nm	T2 Rq/nm
C	0.825	0.083	1.05	0.106
T	0.823	0.079	1.06	0.101
B	0.817	0.080	1.05	0.104
L	0.795	0.084	1.03	0.111
R	0.818	0.082	1.06	0.107
Mean	0.816	0.082	1.05	0.106

Table 2. [in Chinese]

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Resistance change after high temperature	Sample one	Sample two	Sample three
T1 sample	−6.4%	−5.1%	−7.5%
T2 sample	−0.6%	−0.1%	−0.2%

Table 3. [in Chinese]

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VOx deposition conditions	Noise/mV	Response rate/mV·K⁻¹	NETD/mK	Sample size
T1	0.632	16.6	38	200
T2	0.456	17.2	26.5	50
Performance change of T2 relative to T1	−27.8%	3.6%	−30.3%

Table 4. [in Chinese]

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