• Laser & Optoelectronics Progress
  • Vol. 55, Issue 6, 061203 (2018)
Kewei Zhao1、2、1; 2; , Aiying Tan2、2; , Shaoyun Yin2、2; , Wentao Cai2、2; , Ruofu Yang、2*; *; , Jianjun Chen2、2; , and Shoufeng Tong1、1;
Author Affiliations
  • 1 Key Laboratory of Optoelectronic Measurement & Control and Optical Information Transfer Technology, Ministry of Education, Changchun University of Science and Technology, Changchun, Jilin 130022, China;
  • 2 Center of Integrated Optoelectronic Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China
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    DOI: 10.3788/LOP55.061203 Cite this Article Set citation alerts
    Kewei Zhao, Aiying Tan, Shaoyun Yin, Wentao Cai, Ruofu Yang, Jianjun Chen, Shoufeng Tong. Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061203 Copy Citation Text show less
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    Kewei Zhao, Aiying Tan, Shaoyun Yin, Wentao Cai, Ruofu Yang, Jianjun Chen, Shoufeng Tong. Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061203
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