[1] Liu P F, Yang B, Lu K. Design and research on the uniform illumination system of UV exposure machine[J]. Optical Instruments, 34, 31-36(2012).
[2] Gao X. The research of UV-LED lithography system and process[D]. Beijing: Beijing Jiaotong University(2016).
[3] Xu S. Theory and method for in-situ lens aberration measurement in optical lithographic tools based on image intensity[D]. Wuhan: Huazhong University of Science and Technology(2016).
[4] Wang J. Litho polyimide layer resist reduction and CD uniformity research[D]. Tianjin: Tianjin University(2012).
[5] Zhao Y. Design of complex illumination optical system for deep ultraviolet lithography Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences,[D]. China(2010).
[6] Yan J X, Fan W H, Li L W et al. On-line monitoring methods for the exposure uniformity of the stepper[J]. Semiconductor Inspection & Testing Technologies, 37, 577-581(2012).
[7] Sun Y J, Wang Y F[J]. Measurement of uniformity of illumination field using linear array CCD China Measurement Technology, 2003, 26-32.
[8] Liu X G, Li Y J, Gao J. Research for measuring the energy distribution uniformity of laser parallel light curtain[J]. Electro-Optic Technology Application, 25, 12-14(2010).
[9] Shen X H, Yang L, He G X et al. Measurement of image plane illumination non-uniformity of optical system in photoelectric equipment[J]. Optics and Precision Engineering, 16, 2531-2536(2008).
[10] Kang D, Yang H, Sha D et al. Measurement of image plane illumination uniformity of photoelectric imaging system[C]. International Symposium on Advanced Optical Manufacturing and Testing Technologies, 92822O(2014).
[11] Cai H Y, Liu T G, Fu W Q et al. A system for examining the illumination uniformity of camera imaging planes[J]. Optical Technique, 26, 392-394(2000).
[12] Zhang Y, Zeng G Y, Hong Z G. Research of the silicon PIN diode detecting system[J]. Nuclear Electronics & Detection Technology, 20, 391-393(2008).
[13] [M]. Photodiode amplifiers and OP AMP solutions(2012).
Graeme J, Graeme J[M]. 光电二极管及其放大电路设计(2012).
[15] Xu S, Xu Y Z, Chen E G et al. Study on the new models of high power LED current-voltage characteristics[J]. Journal of Optoelectronics·Laser, 26, 2076-2082(2015).
[16] Liu M, Yang Y Q. Instant measurement for physical parameter special distribution uniformity[J]. Journal of Astronautic Metrology and Measurement, 21, 56-61(2001).