A multi-point measurement method for illuminance uniformity of lithography machines is proposed. The method of using ultraviolet (UV) enhanced PIN photodiode can rapidly measure the light intensity of the exposure machine, and the combination of improvement on the basis of traditional current-voltage amplifying circuit and composite amplification greatly improves the repeatability of exposure machine illuminance uniformity multi-point measurement method, and makes every single point measurement repeatability of measurement below 0.02 mW/cm 2. Experimental results show that with the use of UV enhanced PIN photodiode exposure machine light source, multi-point measurement consistency is less than 0.1 mW/cm 2, and the detection of the illuminance uniformity meets the requirements.