• Journal of Infrared and Millimeter Waves
  • Vol. 23, Issue 5, 357 (2004)
[in Chinese]1, [in Chinese]1、2, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. 低阻硅衬底上形成的低损耗共平面波导传输线LOW-LOSS CPW LINE ON LOW-RESISTIVITY SILICON[J]. Journal of Infrared and Millimeter Waves, 2004, 23(5): 357 Copy Citation Text show less

    Abstract

    Low loss and high performance RF/microwave CPW(coplanar waveguide)were fabricated on thicker porous silicon(PS)/ oxidized porous silicon(OPS) substrate associated with polyimide coating to improve smoothness. PS films with different thickness were formed on both N and P-type Si, and the CPW losses on them were discussed. The CPW loss on thick PS is intimately close to quartz, and much lower than the combined substrate of poly-Si / oxidized poly-Si growing on a 2000Ω·cm Si wafer. The insertion loss on PS was lower than 5dB/1.2cm in the range of 0-33GHz, and less than 7.5dB/1.2cm in 33-40GHz.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. 低阻硅衬底上形成的低损耗共平面波导传输线LOW-LOSS CPW LINE ON LOW-RESISTIVITY SILICON[J]. Journal of Infrared and Millimeter Waves, 2004, 23(5): 357
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