The influence of deposition process on the reliability of YbF3 films is studied from four aspects including deposition method, film thickness, substrate temperature and ion beam energy. The research results show that, in contrast to those by resistance heating evaporation, the films deposited by electron beam evaporation have a higher density and lower water-vapor absorption. When the film is too thick or the deposition temperature is too high, the stress of YbF3 film increases, which results in the occurrence of cracks on the film surface or the peeling of coatings. Ion-assisted deposition can enhance the adhesion of YbF3 films and improve the surface quality. As the ion beam energy increases, the stress of coatings first increases and then decreases. According to the above results, the optimal deposition process is obtained and a broadband anti-reflected coating with good optical properties and high reliability is produced.