ZnO/Ag/ZnO three-layer composite films are fabricated by means of radio frequency magnetron sputtering and electron beam evaporation. The influences of Ag film thicknesses and electron beam evaporation deposition rates on the opto-electronic properties of composite films are investigated. The experimental results show that, when the thickness of Ag films is 8 nm and the deposition rate of electron beam evaporation is 0.5 nm·s-1, the properties of composite films are optimal. The square resistance is 6.01 Ω and the average transmissivity of light whose wavelength is at range of 400 nm and 800 nm is 91.39%. The ZnO/Ag/ZnO composite films have good opto-electronic properties after optimization.