• Microelectronics
  • Vol. 51, Issue 6, 918 (2021)
JIANG Yude1, ZHOU Huifang2, ZHAO Linna1, GAN Xinhui2, GU Xiaofeng1, and JI Jianxin2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.13911/j.cnki.1004-3365.210016 Cite this Article
    JIANG Yude, ZHOU Huifang, ZHAO Linna, GAN Xinhui, GU Xiaofeng, JI Jianxin. Study on Breakdown Characteristics of 4H-SiC JBS with JTE Termination[J]. Microelectronics, 2021, 51(6): 918 Copy Citation Text show less

    Abstract

    The breakdown characteristics of 4H-SiC JBS diodes with a JTE termination was studied. First, the impacts of the ion implantation dose, lateral length and interface charge of the JTE terminal on the breakdown voltage were analyzed by simulation. The experimental samples were fabricated based on the optimized process parameters. The measurement results showed that the forward threshold voltage was 152 V, the specific on-resistance was 212 mΩ·cm2, and the breakdown voltage was 1 650 V. The forward current was mainly thermal emission mechanism, while the reverse current had strong voltage and temperature dependence. Finally, the high temperature reverse deviational stress aging test was carried out, and the results showed that the breakdown voltage showed a downtrend.
    JIANG Yude, ZHOU Huifang, ZHAO Linna, GAN Xinhui, GU Xiaofeng, JI Jianxin. Study on Breakdown Characteristics of 4H-SiC JBS with JTE Termination[J]. Microelectronics, 2021, 51(6): 918
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