[4] Dill F H, Hornberger W P, Hauge P S et al.. Characterization of positive photoresist. IEEE Trans. Electron. Devices, 1975, ED-22(7):445~452
[6] Zeng Hunjun, Chen Bo, Guo Lvrong et al.. Edge effect and its application in mask moving technique. Opto-Electronic Engineering, 2000, 27(5):19~22