A new method for precisely control of microlens profile is presented. First, the exposure dose distribution on the surface of photoresist is designed. According to the developing threshold characteristics of the photoresist, precise lens profile is obtained when the developing velocity reaches zero. The influence of developing characteristics of graphic materials to microlens is decreased in this procedure. At last, microlens array with rise with of 114 μm is fabricated in the experiment. By using of this method, the manufacturing of micro-optical elements with high numerical aperture, deep relief depth and aspherical profile is possible.