• Acta Optica Sinica
  • Vol. 35, Issue 6, 611003 (2015)
Shen Lina1、2、3、*, Li Sikun1、2, Wang Xiangzhao1、2, and Yan Guanyong1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/aos201535.0611003 Cite this Article Set citation alerts
    Shen Lina, Li Sikun, Wang Xiangzhao, Yan Guanyong. Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality[J]. Acta Optica Sinica, 2015, 35(6): 611003 Copy Citation Text show less
    References

    [1] M Totzeck, P Graupner, T Heil, et al.. How to describe polarization influence on imaging[C]. SPIE, 2005, 5754: 23-37.

    [2] Q Zhang, H Song, K Lucas. Polarization aberration modeling via Jones matrix in the context of OPC[C]. SPIE, 2007: 6730.

    [3] Tu Yuanying. Study on Polarization Aberration Measurement and Compensation Techniques for Lithographic Projection Optics[D]. Shanghai: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, 2013: 87-89.

    [4] Tu Yuanying, Wang Xiangzhao. Polarization aberration compensation method for lithographic projection lens based on a linear model[J]. Acta Optica Sinica, 2013, 33(6): 0622002.

    [5] J Kye, G Mclntyre, Y Norihiro, et al.. Polarization aberration analysis in optical lithography systems[C]. SPIE, 2006, 6154: 61540E.

    [6] N Yamamoto, J Kye, H J Levinson. Polarization aberration analysis using Pauli- Zernike representation[C]. SPIE, 2007, 6520: 65200Y.

    [7] B Geh, J Ruoff, J Zimmermann, et al.. The impact of projection lens polarization properties on lithographic process at hyper-NA[C]. SPIE, 2007, 6520: 65200F.

    [8] J Ruoff, M Totzeck. Orientation Zernike polynomials: A useful way to describe the polarization effects of optical imaging systems[J]. J Micro/Nanolith MEMS MOEMS, 2009, 8(3): 031404.

    [9] J Ruoff, M Totzeck. Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components[C]. SPIE, 2010, 7652: 76521T

    [10] Y Tu, X Wang, S Li, et al.. Analytical approach to the impact of polarization aberration on lithographic imaging[J]. Opt Lett, 2012, 37(11): 2061-2063.

    [11] A K Wong. Optical Imaging in Projection Microlithography[M]. Bellingham: SPIE Press, 2005: 102-107.

    [12] G R Mclntyre, J Kye, H Levinson, et al.. Polarization aberrations in hyper-numerical-aperture projection printing: A comparison of various representations[J]. J Micro/Nanolith MEMS MOEMS, 2006, 5(3): 033001.

    Shen Lina, Li Sikun, Wang Xiangzhao, Yan Guanyong. Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality[J]. Acta Optica Sinica, 2015, 35(6): 611003
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