• Laser & Optoelectronics Progress
  • Vol. 47, Issue 9, 91301 (2010)
Sun Mei1、*, Xu Degang2, Guo Peiyuan1, and Yao Jianquan2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop47.091301 Cite this Article Set citation alerts
    Sun Mei, Xu Degang, Guo Peiyuan, Yao Jianquan. Transmission Properties of Cross Dipole Fractal Slits for Infrared Wavelengths[J]. Laser & Optoelectronics Progress, 2010, 47(9): 91301 Copy Citation Text show less

    Abstract

    Two-stage cross dipole fractal slits are sample is fabricated by electron beam lithography (EBL) and reactive ion etching (RIE) system,and the width of the fractal slits is about 0.12 μm.The primary and secondary cross dipole arm lengths of the fractal unit are 1.8 μm and 0.8 μm,respectively.The overall size of the sample used in the experiment is 35 μm×35 μm,which is composed of 20×20 periodic array of two-stage cross dipole fractals.The period of the fractal lattice is 1.5 μm.The transmission spectrum of the two stages cross dipole fractal slits is simulated using the transfer-matrix method (TMM) in the near- and mid-infrared region.There are two enhanced transmission peaks at 1.7 μm and 5.2 μm with the transmission coefficient of 36% and 49%.The measured transmission spectrum agrees well with the simulation.
    Sun Mei, Xu Degang, Guo Peiyuan, Yao Jianquan. Transmission Properties of Cross Dipole Fractal Slits for Infrared Wavelengths[J]. Laser & Optoelectronics Progress, 2010, 47(9): 91301
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