[1] Schutze A, Jeong J Y, Babayan S E, et al. IEEE Trans. Plasma Sci., 1998, 26: 1685.
[2] Laroussi M. Plasma Process Polym., 2005, 2: 391.
[3] Babayan S E, Jeong J Y, Tu V J, et al. Plasma Sources Sci. Technol., 1998, 7(3): 286.
[4] Babayan S E, Jeong J Y, Schütze A, et al. Plasma Sources Sci. Technol., 2001, 10(4): 573.
[5] Wang S, Schulz-vonder G V, Dobele H F. Appl. Phys. Lett., 2003, 83(16): 3272.
[6] Lim J P, Uhm H S, Li S Z. Appl. Phys. Lett., 2007, 90: 051504.
[7] Wang H B, Sun W T, Li H P, et al. Appl. Phys. Lett., 2006, 89: 161504.
[8] Li Shouzhe, Huang Wentong, Wang Dezhen. Phys. Plasmas, 2009, 16: 093501.
[9] Pellerin S, Cormier J M, Richard F, et al. J. Phys. D: Appl. Phys., 1996, 29: 726.
[11] Kang Zhengde, Pu Yikang. Chin. Phys. Lett., 2002, 19(2): 211.
[12] Macko P, Martiíovití V, Veis P. Czechoslovak. J. Phys., 2001, 51(5): 491.
[13] Masoud N, Martus K, Figus M, et al. Contrib. Plasma Phys., 2005, 45(1): 30.
[14] Shemansky D E, Broadfoot A L. Quant. Spectrosc. Radiat. Transfer, 1971, 11: 1385.
[15] Peter Bruggeman, Felipe Iza, Peter Guns, et al. Plasma Sources Sci. Technol., 2010, 19: 015016.
[16] Li Shouzhe, Huang Wentong, Wang Dezhen. Phys. Plasmas, 2009, 16: 093501.
[17] Laux C O, Spence T G, Kruger C H, et al. Plasma Sources Sci. Technol., 2003, 12: 125.