• Microelectronics
  • Vol. 51, Issue 3, 404 (2021)
QIAO Jie and FENG Quanyuan
Author Affiliations
  • [in Chinese]
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    DOI: 10.13911/j.cnki.1004-3365.200312 Cite this Article
    QIAO Jie, FENG Quanyuan. An Enhanced HEMT Using P-GaN Gate Combined with Recessed-Gate Technology[J]. Microelectronics, 2021, 51(3): 404 Copy Citation Text show less
    References

    [3] HE Y L, HE Q, MI M H, et al. Fully recessed-gate normally-off AlGaN/GaN high electron mobility transistors with high breakdown electric field [C] // 1st WiPDA Asia. Xi'an, China. 2018: 203-207.

    [4] DONG N, LIU M, SHI L, et al. A normally-off P-Gate AlGaN/GaN HEMT for high power application [C] // IEEE Int Conf EDSSC. Shenzhen, China. 2018: 1-2.

    [5] RAJABI S, OROUJI A A, MOGHADAM H A, et al. A novel AlGaN/GaN/AlGaN double-heterojunction high electron mobility transistor for performance improvement [C] // IEEE ICSCCN. Thuckafay, India. 2011: 675-678.

    [6] SAITO W, TAKADA Y, KURAGUCHI M, et al. Recessed-gate structure approach toward normally off high-voltage AlGaN/GaN HEMT for power electronics applications [J]. IEEE Trans Elec Dev, 2006, 53(2): 356-362.

    [8] MA J, ZHANG J, XUE J, et al. Overcoming the poor crystal quality and DC characteristics of AlGaN/ GaN/AlGaN double-heterostructure high electron mobility transistors [J]. Physica Status Solidi A-Appl & Mater Sci, 2016, 213(8): 2203-2207.

    [10] AMBACHER O, MAJEWSKI J, MISKYS C, et al. Pyroelectric properties of Al(In)GaN/GaN hetero-and quantum well structures [J]. J Phys Conden Matt, 2002, 14(13): 3399-3434.

    QIAO Jie, FENG Quanyuan. An Enhanced HEMT Using P-GaN Gate Combined with Recessed-Gate Technology[J]. Microelectronics, 2021, 51(3): 404
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