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    Journals >Acta Optica Sinica >Volume 33 >Issue 10 >Page 1034002 > Article
    • Acta Optica Sinica
    • Vol. 33, Issue 10, 1034002 (2013)
    Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node
    Du Yuchan1、*, Li Hailiang1, Shi Lina1, Li Chun2, and Xie Changqing1
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos201333.1034002 Cite this Article Set citation alerts
    Du Yuchan, Li Hailiang, Shi Lina, Li Chun, Xie Changqing. Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node[J]. Acta Optica Sinica, 2013, 33(10): 1034002 Copy Citation Text show less
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    Article index updated: May. 19, 2024
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    Du Yuchan, Li Hailiang, Shi Lina, Li Chun, Xie Changqing. Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node[J]. Acta Optica Sinica, 2013, 33(10): 1034002
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