The study of SiH4N2gas discharge plasma with LIF

[in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 10 >Issue 4 >Page 316 > Article

Acta Optica Sinica
Vol. 10, Issue 4, 316 (1990)

The study of SiH₄N₂gas discharge plasma with LIF

[in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese]. The study of SiH₄N₂gas discharge plasma with LIF[J]. Acta Optica Sinica, 1990, 10(4): 316 Copy Citation Text

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[in Chinese], [in Chinese], [in Chinese]. The study of SiH₄N₂gas discharge plasma with LIF[J]. Acta Optica Sinica, 1990, 10(4): 316

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