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Journals >Acta Optica Sinica >Volume 10 >Issue 4 >Page 316 > Article

Acta Optica Sinica
Vol. 10, Issue 4, 316 (1990)

The study of SiH₄N₂gas discharge plasma with LIF

[in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese]. The study of SiH₄N₂gas discharge plasma with LIF[J]. Acta Optica Sinica, 1990, 10(4): 316 Copy Citation Text

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Abstract

Mixed SiH4/N2 gas radio-frequency (RF) discharge plasma has been studied with laserr induced fluorescence (LIF). The intermediate species Si2 has been detected, and detection of Si2 in SiH4 RF discharge decomposition has not been reparted before.

Keywords

chemical vapor deposition plasma radio-frequency discharge decomposition

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[in Chinese], [in Chinese], [in Chinese]. The study of SiH₄N₂gas discharge plasma with LIF[J]. Acta Optica Sinica, 1990, 10(4): 316

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