• Chinese Physics B
  • Vol. 29, Issue 10, (2020)
Jie-Yu Li1、2, Yang Wang1、2、†, Dan-Dan Jia1、2, Wei-Peng Wei1、2, and Peng Dong3
Author Affiliations
  • 1School of Physics and Optoelectronics, Xiangtan University, Xiangtan 405, China
  • 2Hunan Engineering Laboratory for Microelectronics, Optoelectronics and System on A Chip, Xiangtan 411105, China
  • 3SuperESD Microelectronics Technology CO., LTD., Changsha 410100, China
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    DOI: 10.1088/1674-1056/ab9f28 Cite this Article
    Jie-Yu Li, Yang Wang, Dan-Dan Jia, Wei-Peng Wei, Peng Dong. New embedded DDSCR structure with high holding voltage and high robustness for 12-V applications[J]. Chinese Physics B, 2020, 29(10): Copy Citation Text show less

    Abstract

    A new dual directional silicon-controlled rectifier based electrostatic discharge (ESD) protection device suitable for 12-V applications is proposed in this paper. The proposed device (NPEMDDSCR) is based on the embedded DDSCR (EMDDSCR) structure, in which the P+ electrode and P+ injection are removed from the inner finger. Compared with the conventional modified DDSCR (MDDSCR), its high holding voltage meets the requirements for applications. Compared with the embedded DDSCR (EMDDSCR), it has good conduction uniformity. The MDDSCR, EMDDSCR, and NPEMDDSCR are fabricated with an identical width in a 0.5-μm CDMOS process. In order to verify and predict the characteristics of the proposed ESD protection device, a transmission line pulse (TLP) testing system and a two-dimensional device simulation platform are used in this work. The measurements demonstrate that the NPEMDDSCR provides improved reliability and higher area efficiency for 12 V or similar applications. The measurement results also show that the NPEMDDSCR provides higher robustness and better latch-up immunity capability.
    Jie-Yu Li, Yang Wang, Dan-Dan Jia, Wei-Peng Wei, Peng Dong. New embedded DDSCR structure with high holding voltage and high robustness for 12-V applications[J]. Chinese Physics B, 2020, 29(10):
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