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Journals >Laser & Optoelectronics Progress >Volume 60 >Issue 7 >Page 0736001 > Article

Laser & Optoelectronics Progress
Vol. 60, Issue 7, 0736001 (2023)

Shuo Wang^1、2, Fangshu Li^1、3, Haocheng Lu^1、2, Wenyang Zheng^1、2, Xulin Zhao^1、4, Yang Jiang^1、2, Na Li^1、5、*, Ya Bai^1、2、**, and Peng Liu^1、2

Author Affiliations

¹State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³China MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

⁴Department of Physics, Shanghai University, Shanghai 200444, China

⁵School of Physics and Electronic Engineering, Xinxiang University, Xinxiang 453003, Henan, China

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DOI: 10.3788/LOP230448 Cite this Article Set citation alerts

Shuo Wang, Fangshu Li, Haocheng Lu, Wenyang Zheng, Xulin Zhao, Yang Jiang, Na Li, Ya Bai, Peng Liu. [J]. Laser & Optoelectronics Progress, 2023, 60(7): 0736001 Copy Citation Text

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References

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Shuo Wang, Fangshu Li, Haocheng Lu, Wenyang Zheng, Xulin Zhao, Yang Jiang, Na Li, Ya Bai, Peng Liu. [J]. Laser & Optoelectronics Progress, 2023, 60(7): 0736001

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