• Chinese Optics Letters
  • Vol. 14, Issue 5, 051602 (2016)
Xiaodan Wang1、*, Yajuan Mo1, Xionghui Zeng2、**, Hongmin Mao1, Jianfeng Wang2、3, and Ke Xu2、3
Author Affiliations
  • 1Department of Physics, Suzhou University of Science and Technology, Suzhou 215009, China
  • 2Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
  • 3Suzhou Nanowin Science and Technology Co., Ltd., Suzhou 215123, China
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    DOI: 10.3788/COL201614.051602 Cite this Article Set citation alerts
    Xiaodan Wang, Yajuan Mo, Xionghui Zeng, Hongmin Mao, Jianfeng Wang, Ke Xu. Investigation of low-temperature cathodoluminescence mechanism of Er-doped GaN thick films by ion implantation[J]. Chinese Optics Letters, 2016, 14(5): 051602 Copy Citation Text show less
    Normalized room temperature cathodoluminescence spectra of virgin GaN and 5×1015 Er/cm2-implanted GaN.
    Fig. 1. Normalized room temperature cathodoluminescence spectra of virgin GaN and 5×1015 Er/cm2-implanted GaN.
    Normalized room temperature cathodoluminescence spectra of 1×1015 Er/cm2-implanted GaN before and after annealing at 1100°C.
    Fig. 2. Normalized room temperature cathodoluminescence spectra of 1×1015Er/cm2-implanted GaN before and after annealing at 1100°C.
    Normalized room temperature cathodoluminescence spectra of 1×1015 Er/cm2-implanted GaN after 1100°C annealing, at different accelerating voltages of the scanning electron microscope.
    Fig. 3. Normalized room temperature cathodoluminescence spectra of 1×1015Er/cm2-implanted GaN after 1100°C annealing, at different accelerating voltages of the scanning electron microscope.
    Room temperature cathodoluminescence spectra of Er-implanted GaN with different doses annealed at 1100°C. The accelerating voltage of the scanning electron microscope is 5 kV.
    Fig. 4. Room temperature cathodoluminescence spectra of Er-implanted GaN with different doses annealed at 1100°C. The accelerating voltage of the scanning electron microscope is 5 kV.
    Cathodoluminescence spectra of 1×1015 Er/cm2-implanted GaN annealed at 1100°C. The temperature is from 82 to 323 K and the accelerating voltage of the scanning electron microscope is 5 kV.
    Fig. 5. Cathodoluminescence spectra of 1×1015 Er/cm2-implanted GaN annealed at 1100°C. The temperature is from 82 to 323 K and the accelerating voltage of the scanning electron microscope is 5 kV.
    Implantation dose of Er (atom/cm2)Band-edge peak (nm)FWHM (nm)
    0(virgin)3628.5
    1×10133649.0
    1×10143659.3
    1×10153659.3
    5×1015365.69.8
    Table 1. Position and FWHM of Cathodoluminescence Peaks of Virgin GaN and Er-Implanted GaN with Different Dosesa
    Annealing temperature (°C)Band-edge peak (nm)FWHM (nm)
    unannealing3659.3
    8003658.6
    9503658.6
    11003678.3
    Table 2. Position and FWHM of the Band-Edge Peaks of 1×1015 Er/cm2-Implanted GaN Before and After Annealinga
    Xiaodan Wang, Yajuan Mo, Xionghui Zeng, Hongmin Mao, Jianfeng Wang, Ke Xu. Investigation of low-temperature cathodoluminescence mechanism of Er-doped GaN thick films by ion implantation[J]. Chinese Optics Letters, 2016, 14(5): 051602
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