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    Journals >Opto-Electronic Engineering >Volume 31 >Issue 3 >Page 8 > Article
    • Opto-Electronic Engineering
    • Vol. 31, Issue 3, 8 (2004)
    Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference
    [in Chinese]1、2, [in Chinese]1, and [in Chinese]2
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference[J]. Opto-Electronic Engineering, 2004, 31(3): 8 Copy Citation Text show less
    References

    [1] SPALLAS J P,HAWRYLUK A M, KANIA D R. Field emitter array mask patterning using laser interference lithography[J].J.Vac.Sci.Technol. B,1995,13(5):1973-1978.

    [2] ZAIDI S H,BRUECK S R J.Interferometric lithography for nanoscale fabrication[J].SPIE,1999,3618: 2-8.

    [3] FERNANDEZ A,NGUYEN H T,BRITrEN J A,et al.Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays[J]. J.Vac.Sci. Technol.B,1997,15(3):729-735.

    [4] COWAN J J.The recording and large scale replication of crossed holographic grating arrays using multiple beam interferometry[J].SPIE,1984,503:120-129.

    [5] DANIEL S C,CURTIS W P.Small field-of-view star identification using Bayesian decision theory [J].IEEE Transactions on Aerospace and Electronic system,2000,36(3):773-783.

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    [in Chinese], [in Chinese], [in Chinese]. Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference[J]. Opto-Electronic Engineering, 2004, 31(3): 8
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