Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference

[in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 31 >Issue 3 >Page 8 > Article

Opto-Electronic Engineering
Vol. 31, Issue 3, 8 (2004)

Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference

[in Chinese]^1、2, [in Chinese]¹, and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese]. Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference[J]. Opto-Electronic Engineering, 2004, 31(3): 8 Copy Citation Text

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Abstract

[in Chinese], [in Chinese], [in Chinese]. Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference[J]. Opto-Electronic Engineering, 2004, 31(3): 8

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