Bin Shen, Huai Xiong, Xu Zhang, Haiyuan Li. Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)[J]. Acta Optica Sinica, 2020, 40(22): 2216001
- Acta Optica Sinica
- Vol. 40, Issue 22, 2216001 (2020)
Fig. 1. Particle size distributions of SiO2 in sol with different concentrations
Fig. 2. Optical properties of fourth harmonic generation SiO2 antireflective films. (a) Transmittance curves; (b) transmittance values at 266 nm
Fig. 3. Refractive index of fourth harmonic generation SiO2 antireflective films
Fig. 4. Surface roughness (root-mean-square) of fourth harmonic generation SiO2 antireflective films
Fig. 5. Schematic of laser damage resistance of sol-gel SiO2 film
Fig. 6. Scanning electron micrograph of 1# film surface
Fig. 7. Laser damage test of fourth harmonic generation SiO2 antireflective films. (a) Laser-induced damage threshold; (b) damage morphology of 1# film
Fig. 8. Properties of fourth harmonic generation SiO2 antireflective films in high humidity environment. (a) Transmittance change at 266 nm; (b) contact angle change
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Table 1. Thickness of the film prepared in SiO2 sol with different concentrations
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