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    Journals >Acta Optica Sinica >Volume 40 >Issue 22 >Page 2216001 > Article
    • Acta Optica Sinica
    • Vol. 40, Issue 22, 2216001 (2020)
    Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)
    Bin Shen*, Huai Xiong, Xu Zhang, and Haiyuan Li
    Author Affiliations
  • Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    DOI: 10.3788/AOS202040.2216001 Cite this Article Set citation alerts
    Bin Shen, Huai Xiong, Xu Zhang, Haiyuan Li. Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)[J]. Acta Optica Sinica, 2020, 40(22): 2216001 Copy Citation Text show less
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    Article index updated: May. 16, 2024
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    Bin Shen, Huai Xiong, Xu Zhang, Haiyuan Li. Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)[J]. Acta Optica Sinica, 2020, 40(22): 2216001
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    Paper Information
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