• Microelectronics
  • Vol. 52, Issue 3, 473 (2022)
SUN Haonan, WANG Junchao, LI Haoliang, YANG Xiaonan, and ZHANG Yingtao
Author Affiliations
  • [in Chinese]
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    DOI: 10.13911/j.cnki.1004-3365.210141 Cite this Article
    SUN Haonan, WANG Junchao, LI Haoliang, YANG Xiaonan, ZHANG Yingtao. A Dual Direction LDMOS_SCR for High Voltage ESD Protection Device[J]. Microelectronics, 2022, 52(3): 473 Copy Citation Text show less

    Abstract

    The lateral double diffused MOSFET silicon controlled rectifiers(LDMOS_SCR) device structure was commonly used for electrostatic protection at high voltage due to excellent high voltage characteristics. The N+ of the floating drain pole was divided into symmetric P+, N+ and P+ structures, and a dual directional protection of power device based on LDMOS_SCR with low trigger and high holding voltage was proposed. It reduced the emitter-injection efficiency of parasitic bipolar transistors formed at the bottom of the grid region, and the inherent positive feedback mechanism of the SCR was reduced. Based on TCAD simulation, the experimental results showed that, compared with the traditional LDMOS_DDSCR, the trigger voltage of the new device was reduced from 69.6 V to 48.5 V, and the holding voltage was increased from 14.9 V to 17 V. It was proved that the new structure had a good immunity ability of latch-up effect compared with the traditional LDMOS_DDSCR device.
    SUN Haonan, WANG Junchao, LI Haoliang, YANG Xiaonan, ZHANG Yingtao. A Dual Direction LDMOS_SCR for High Voltage ESD Protection Device[J]. Microelectronics, 2022, 52(3): 473
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