• Journal of Semiconductors
  • Vol. 40, Issue 5, 052402 (2019)
Li Tian, Jianbing Cheng, Cairong Zhang, Li Shen, and Lei Wang
Author Affiliations
  • College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing, China
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    DOI: 10.1088/1674-4926/40/5/052402 Cite this Article
    Li Tian, Jianbing Cheng, Cairong Zhang, Li Shen, Lei Wang. Design and analysis of a NMOS triggered LIGBT structure for electrostatic discharge protection[J]. Journal of Semiconductors, 2019, 40(5): 052402 Copy Citation Text show less

    Abstract

    A novel NMOS triggered LIGBT (NTLIGBT) structure is proposed for electrostatic discharge (ESD) protection in this paper. The structure utilizes internal NMOS to trigger SCR-like structure in LIGBT. The trigger voltage is significantly reduced because the embedded NMOS causes N+-drain/P-body junction being apt to avalanche breakdown. At the same time, the new parasitic PNP transistor including the newly added P+-region as a collector forms another path to bleed ESD current and then the conductivity modulation in the LIGBT is weakened. As a result, the holding voltage is increased. So, the proposed NTLIGBT structure has a narrow ESD design window. The simulation results show an improvement of 71.5% in trigger voltage and over 50% in holding voltage comparing with the conventional LIGBT structure.
    $ {V_{\rm{h}}} = {V_{{\rm{pbe}}}} + {V_{{\rm{nbe}}}} + {V_{{\rm{potential}}}} + I {R_{{\rm{on}}}}. $ (1)

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    Li Tian, Jianbing Cheng, Cairong Zhang, Li Shen, Lei Wang. Design and analysis of a NMOS triggered LIGBT structure for electrostatic discharge protection[J]. Journal of Semiconductors, 2019, 40(5): 052402
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