Study on the Properties of the Pc-Si Films Prepared by Magnetron Co-Sputtering at Low Temperature

DUAN Liang-fei; YANG Wen; ZHANG Li-yuan; LI Xue-ming; CHEN Xiao-bo; YANG Pei-zhi

doi:10.3964/j.issn.1000-0593(2016)03-0635-05

Journals >Spectroscopy and Spectral Analysis >Volume 36 >Issue 3 >Page 635 > Article

Spectroscopy and Spectral Analysis
Vol. 36, Issue 3, 635 (2016)

Study on the Properties of the Pc-Si Films Prepared by Magnetron Co-Sputtering at Low Temperature

DUAN Liang-fei^1、2、*, YANG Wen^1、2, ZHANG Li-yuan^1、2, LI Xue-ming^1、2, CHEN Xiao-bo^1、2, and YANG Pei-zhi^1、2

Author Affiliations

¹[in Chinese]

²[in Chinese]

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DOI: 10.3964/j.issn.1000-0593(2016)03-0635-05 Cite this Article

DUAN Liang-fei, YANG Wen, ZHANG Li-yuan, LI Xue-ming, CHEN Xiao-bo, YANG Pei-zhi. Study on the Properties of the Pc-Si Films Prepared by Magnetron Co-Sputtering at Low Temperature[J]. Spectroscopy and Spectral Analysis, 2016, 36(3): 635 Copy Citation Text

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References

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