• Acta Optica Sinica
  • Vol. 19, Issue 1, 113 (1999)
[in Chinese]1, [in Chinese]2, and [in Chinese]2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese]. Acceptable Error of Etching Depth in Ion Beam Etching Microlens[J]. Acta Optica Sinica, 1999, 19(1): 113 Copy Citation Text show less

    Abstract

    Based on the diffraction optical principle, a formula of the diffraction efficiency and etching depth error of the microlens is obtained. The results show that the time control method of ion beam etching meets the needs of micro-fabrication of L=1′s microlens and the etching depth error should be smaller than 87 nm in the micro-fabrication of L>1′s microlens.