Study on the Exposure Characteristics of Prehardened DCG Used as Photoresist to Resist Enzyme Etching

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 17 >Issue 2 >Page 216 > Article

Acta Optica Sinica
Vol. 17, Issue 2, 216 (1997)

Study on the Exposure Characteristics of Prehardened DCG Used as Photoresist to Resist Enzyme Etching

[in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

Author Affiliations

¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the Exposure Characteristics of Prehardened DCG Used as Photoresist to Resist Enzyme Etching[J]. Acta Optica Sinica, 1997, 17(2): 216 Copy Citation Text

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Abstract

The exposure characteristics of prehardened dichromate gelatin (DCG) used as photoresist to resist enzyme etching are presented herein. The experimental results and the effect of three primary factors on the exposure characteristics are discussed.

Keywords

continuous relief DOEs photolithography protein digesting enzyme DCG

[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the Exposure Characteristics of Prehardened DCG Used as Photoresist to Resist Enzyme Etching[J]. Acta Optica Sinica, 1997, 17(2): 216

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