Author Affiliations
1State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China2School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, China3School of Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, Chinashow less
Fig. 1. Schematic configuration of the proposed intelligent metasurface.
Fig. 2. (a) Geometrical model of the unit cell for the executing metasurface. (b) Photography of the fabricated metasurface sample. The metallic patterns on the top layer are serially connected in each row, while they are connected in parallel on the bottom layer.
Fig. 3. Simulated and measured reflection/transmission properties of the proposed executing metasurface under the different operation modes with the corresponding diode configurations of (PIN diode 1, PIN diode 2). (a) Reflection mode. (b) Transmission mode. (c), (d) Reflection and transmission properties at the tunable absorption mode.
Fig. 4. (a) Configuration of the sensing module for the incident power detecting. It is composed of an ultra-wideband patch antenna and a power detecting chip with the peripheral circuit. Values of the circuit parameters are chosen as follows: R1=68 kΩ, R2=82 kΩ, R3=10 kΩ, R4=10 kΩ, C1=39 pF, C2=100 pF, C3=0.1 μF. (b) Gain of the designed patch antenna and its radiation patterns at 5, 7, and 9 GHz. (c) Measured feedback voltage of the power detectors at 6 GHz for the different incident power intensities.
Fig. 5. (a) Sketch of the measurement system for the intelligent metasurface and (b) photograph of the measurement setup in the microwave anechoic chamber.
Fig. 6. (a)–(g) Transmitted power intensity of the metasurface under the different incident power intensities at the frequency of 5, 5.2, 6, 7, 8, 9, and 10 GHz. (h), (i) Measured reflection and transmission of the proposed metasurface for the different illuminating power intensities.
Function | State of PIN Diode 1 | State of PIN Diode 2 |
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Reflection | ON | OFF | Transmission | OFF | OFF | Tunable absorption | ON | Tunable resistance | ON | ON |
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Table 1. PIN Diode Configurations for the Different EM Functionalities of the Proposed Metasurface
Function | Illuminating Power (dBm) | Feedback Voltage (V) | Bias Voltage on Top-Layer Metasurface (V) | Bias Voltage on Bottom-Layer Metasurface (V) |
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Reflection | | | 0 | 1.5 | Transmission | −20 to −13 | 0.8–1 | 0 | 0 | Tunable absorption | −13 to −9 | 1–1.4 | 24–27 | 1.5 | −9 to −2 | 1.4–2.2 | 22–24 | 1.5 | −2 to 10 | | 19–22 | 1.5 |
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Table 2. Mapping Relationship among the Incident Power Intensity, Received Feedback Voltage, and Controlling Bias Voltage for the Different Layers of the Proposed Metasurface