Research Progress and Prospects of Non-oxide Ceramic in Stereolithography Additive Manufacturing

Yong YANG; Xiaotian GUO; Jie TANG; Haotian CHANG; Zhengren HUANG; Xiulan HU

doi:10.15541/jim20210705

Journals >Journal of Inorganic Materials >Volume 37 >Issue 3 >Page 267 > Article

Journal of Inorganic Materials
Vol. 37, Issue 3, 267 (2022)

Research Progress and Prospects of Non-oxide Ceramic in Stereolithography Additive Manufacturing

Yong YANG^1,2, Xiaotian GUO^1,3, Jie TANG^1,2, Haotian CHANG^1,3..., Zhengren HUANG^1,2 and Xiulan HU^3,*|Show fewer author(s)

Author Affiliations

¹1. State Key Laboratory of High Performance Ceramics and Superfine Microstructures, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China

²2. College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China

³3. College of Materials Science and Engineering, Nanjing Tech University, Nanjing 211816, China

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DOI: 10.15541/jim20210705 Cite this Article

Yong YANG, Xiaotian GUO, Jie TANG, Haotian CHANG, Zhengren HUANG, Xiulan HU. Research Progress and Prospects of Non-oxide Ceramic in Stereolithography Additive Manufacturing[J]. Journal of Inorganic Materials, 2022, 37(3): 267 Copy Citation Text

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1. Prototyping mechanism of stereolithography^[1]

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2. Schematic drawing of the light transferring among ceramic slurry^[29]

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3. Schematic diagram of flow of SiC slurry with different particle size distributions under shear stress^[49]

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4. Preparation of SiC ceramic-based composite by stereolithography^[52]

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5. Preparation of C_f/SiC ceramic composites by digital light processing technology and liquid silicon infiltration process^[46]

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6. Preparation of Si₃N₄-SiO₂ ceramics by digital light processing (DLP) technology^[58]

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7. Fabrication of complex shaped ceramic parts with surface- oxidized Si₃N₄ powder via digital light processing based stereolithography method^[60]

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Material	Absorbance (d/μm, λ/nm)	Refractive index (d/μm, λ/nm)
Al₂O₃^{[3,4,5,6,7,8]}	0.044 (10, 405)	1.787 (2.3, 365)
ZrO₂^{[9,10,11,12,13]}	0.003 (10, 405)	Low
ZTA^[14,15,16]	Low	Low
SiO₂^[17,18,19]	Low	1.564 (2.25, 365)
SiC^{[20,21,22,23]}	0.479 (10, 405)	2.553 (12.25, 467-691)
Si₃N₄^{[20,21,22,23]}	0.180 (5, 405)	2.023 (-, 632.8)
TiO₂^{[20,21,22,23]}	Low	2.493 (-, 632.8)
BN^{[20,21,22,23]}	High	High

Table 1. Refractive index and absorbance of ceramic materials

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Material	Flexural strength/MPa	Elasticity modulus/GPa	Fracture toughness/ (MPa·m^1/2)
RB-SiC^[42]	≥330	≥340	≥4.1
S-SiC^[43]	349-431	308-342	3.77
RB-SiC^[44]	(305±15)	-	-
RB-SiC*^[45]	210.4	-	-
(C_f)/SiC*^[46]	262.6	-	-

Table 2. Structure and properties of SiC ceramics obtained by different manufacturing methods

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Material	Technology	Resin+photoinitiator	Dispersant	Powder	Cured thickness /μm	Solid content/% (in volume)	Bending strength /MPa	Ref.
SiC	DLP	HDDA+DVE-3+ TPO	KOS110	15 μm SiC	78	30	-	[29]
SiC	DLP	HDDA+TMPTA+TPO	KOS110+ 17000	15 μm SiC+ ~40 nm SiC	-	45	165.2	[48]
SiC	DLP	ACMO+HDDA+ TMPTA+BAPO	4200	10 μm SiC	≈60	40	50.18	[49]
Al₂O₃-Si₃N₄	SLA	TMPTA+HDDA+ Irgacure 184	PEG200+ glycerol	1 μm Al₂O₃+ 200 nm Si₃N₄	40	47	-	[57]
SiO₂-Si₃N₄	DLP	TMPTA+Irgacure 184	-	3.45 μm Si₃N₄+ Y₂O₃+Al₂O₃	50-60	50	(77±5)	[58]
Si₃N₄	DLP	HDDA+TMPTA+819	Copolymer	200 nm oxidized Si₃N₄	51	-	-	[60]
Si₃N₄	DLP	EA+819+HDDA+184	Darvan	800 nm (KH-560)Si₃N₄	50	45	-	[62]

Table 3. Comparison of molding and sintering performances in stereolithography of high refractive index and high absorbance ceramics

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