Thermal Annealing Effect on Photoluminescence of Y2O3:Eu3+ Thin Films Prepared by Magnetron Sputtering

Shun-hui LIN; Li-hui ZHANG; Yong-quan LIU; Xiao-kun WANG; Chun-lei LIN; Yun-peng YU

doi:10.3964/j.issn.1000-0593(2020)11-3336-05

Journals >Spectroscopy and Spectral Analysis >Volume 40 >Issue 11 >Page 3336 > Article

Spectroscopy and Spectral Analysis
Vol. 40, Issue 11, 3336 (2020)

Thermal Annealing Effect on Photoluminescence of Y₂O₃:Eu³⁺ Thin Films Prepared by Magnetron Sputtering

Shun-hui LIN^*, Li-hui ZHANG, Yong-quan LIU, Xiao-kun WANG, Chun-lei LIN, and Yun-peng YU

Author Affiliations

Research Center for Advanced Optics and Photoelectronics, College of Science, Shantou University, Shantou 515063, China

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DOI: 10.3964/j.issn.1000-0593(2020)11-3336-05 Cite this Article

Shun-hui LIN, Li-hui ZHANG, Yong-quan LIU, Xiao-kun WANG, Chun-lei LIN, Yun-peng YU. Thermal Annealing Effect on Photoluminescence of Y₂O₃:Eu³⁺ Thin Films Prepared by Magnetron Sputtering[J]. Spectroscopy and Spectral Analysis, 2020, 40(11): 3336 Copy Citation Text

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Fig. 1. XRD patterns of the films

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Fig. 2. Excitation spectra of the films (λ_em=612 nm)

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Fig. 3. PL spectra of the films under 252 nm excitation

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sample number	1-1 1-2 1-3 1-4	2-1 2-2 2-3 2-4	3-1 3-2 3-3 3-4
substrate temperature/℃	200	200	300
gas pressure/Pa	0.5	0.5	1.0
sputtering power/W	100	120	120
annealing temperature/℃	R.T. 700 900 1 100	R.T. 700 900 1 100	R.T. 700 900 1 100

Table 1. Deposition parameters of the films and annealing temperatures (R.T.: Room Temperature)

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Sample	Y/at%	Eu/at%	Eu/Y/%
1-1	10.38	0.02	0.2
1-2	11.06	0.01	0.1
1-3	9.85	0.01	0.1
1-4	9.87	0.005	0.05

Table 2. EDS results of Y and Eu elements in the group Ⅰ samples

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