• Advanced Photonics
  • Vol. 4, Issue 6, 066002 (2022)
Dazhao Zhu1、†, Liang Xu2, Chenliang Ding1, Zhenyao Yang1, Yiwei Qiu1, Chun Cao1, Hongyang He3, Jiawei Chen3, Mengbo Tang1, Lanxin Zhan1, Xiaoyi Zhang1, Qiuyuan Sun1, Chengpeng Ma1, Zhen Wei1, Wenjie Liu1、2, Xiang Fu4, Cuifang Kuang1、2、*, Haifeng Li1、2, and Xu Liu1、2、*
Author Affiliations
  • 1Zhejiang Lab, Research Center for Intelligent Chips and Devices, Hangzhou, China
  • 2Zhejiang University, College of Optical Science and Engineering, State Key Laboratory of Modern Optical Instrumentation, Hangzhou, China
  • 3Zhejiang University, College of Control Science and Engineering, State Key Laboratory of Industrial Control Technology, Hangzhou, China
  • 4Zhejiang Lab, Research Center for Humanoid Sensing, Zhejiang Lab, Hangzhou, China
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    DOI: 10.1117/1.AP.4.6.066002 Cite this Article Set citation alerts
    Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, Xu Liu. Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography[J]. Advanced Photonics, 2022, 4(6): 066002 Copy Citation Text show less

    Abstract

    Direct laser writing (DLW) enables arbitrary three-dimensional nanofabrication. However, the diffraction limit poses a major obstacle for realizing nanometer-scale features. Furthermore, it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems, which cannot perform high-throughput lithography. To overcome these challenges, a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study, based on two-photon polymerization DLW. The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures. The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.
    Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, Xu Liu. Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography[J]. Advanced Photonics, 2022, 4(6): 066002
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