Laser Plasma Soft X-Ray Source with Cryogenic Target

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 18 >Issue 6 >Page 675 > Article

Acta Optica Sinica
Vol. 18, Issue 6, 675 (1998)

Laser Plasma Soft X-Ray Source with Cryogenic Target

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser Plasma Soft X-Ray Source with Cryogenic Target[J]. Acta Optica Sinica, 1998, 18(6): 675 Copy Citation Text

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References

[1] Frits Zernike, David TAttwood (eds.). OSA Proceedings on Extreme Ultraviolet Lithography. Optical Society America, 1994. 23

[2] A. M. Hawryluk, N. M. Ceglio. Wavelength considerations in soft-X-ray projection lithography. Appl. Opt., 1993, 32(34): 1669～1672

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser Plasma Soft X-Ray Source with Cryogenic Target[J]. Acta Optica Sinica, 1998, 18(6): 675

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