FABRICATION OF Si CONCAVE MICROLENSES ARRAY

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Journal of Infrared and Millimeter Waves >Volume 21 >Issue 1 >Page 33 > Article

Journal of Infrared and Millimeter Waves
Vol. 21, Issue 1, 33 (2002)

FABRICATION OF Si CONCAVE MICROLENSES ARRAY

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]²

Author Affiliations

¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. FABRICATION OF Si CONCAVE MICROLENSES ARRAY[J]. Journal of Infrared and Millimeter Waves, 2002, 21(1): 33 Copy Citation Text

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References

[1] Severi M, Motter P. Etching selectivity control during resist pattern transfer to silicon for the fabrication of microlens with reduced spherical aberration.Opt.Eng.,1999,38(1): 146-150

[2] Stern M B, Jay T R. Dry etching for coherent refractive microlens array and technique for monolithic fabrication.Opt. Eng.,1994,33(11) : 3547-3551

[3] Jay T R, Stern M B, Knowlden R E. Refractive microlens array fabrication parameters and their effect on optical performance. Proc. SPIE,1992,1751: 236-245

[4] Keyworth B P, Corazza D J, Mcmallin J N,et al. Single-step fabrication of refractive microlens arrays.Appl.Opt.,1997,36(10): 2198-2201

CLP Journals

[1] Li Xiaogang, Chen Jimin, Liu Furong, Li Xiaoyu, Zhang Qiang. PMMA Microlens Array Preparation Using Carbon Dioxide Laser[J]. Acta Optica Sinica, 2010, 30(s1): 100104

[2] Xiao Yanfen, Zhu Jing, Yang Baoxi, Hu Zhonghua, Zeng Aijun, Huang Huijie. Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems[J]. Chinese Journal of Lasers, 2013, 40(2): 216001

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. FABRICATION OF Si CONCAVE MICROLENSES ARRAY[J]. Journal of Infrared and Millimeter Waves, 2002, 21(1): 33

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