Influence of roughness on extreme ultra-violet lithography mask

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 32 >Issue 10 >Page 80 > Article

Opto-Electronic Engineering
Vol. 32, Issue 10, 80 (2005)

Influence of roughness on extreme ultra-violet lithography mask

[in Chinese]^1、2, [in Chinese]¹, [in Chinese]^1、2, and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of roughness on extreme ultra-violet lithography mask[J]. Opto-Electronic Engineering, 2005, 32(10): 80 Copy Citation Text

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Abstract

[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of roughness on extreme ultra-violet lithography mask[J]. Opto-Electronic Engineering, 2005, 32(10): 80

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