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    Journals >Opto-Electronic Engineering >Volume 32 >Issue 10 >Page 80 > Article
    • Opto-Electronic Engineering
    • Vol. 32, Issue 10, 80 (2005)
    Influence of roughness on extreme ultra-violet lithography mask
    1,2, 1, 1,2, and 1
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of roughness on extreme ultra-violet lithography mask[J]. Opto-Electronic Engineering, 2005, 32(10): 80 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of roughness on extreme ultra-violet lithography mask[J]. Opto-Electronic Engineering, 2005, 32(10): 80
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