A study on low emittance injector and undulator for PAL-XFEL

J. Hong; J.-H. Han; S.J. Park; Y.G. Jung; D.E. Kim; H.-S. Kang; J. Pflueger

doi:10.1017/hpl.2015.18

Journals >High Power Laser Science and Engineering >Volume 3 >Issue 3 >Page 03000001 > Article

High Power Laser Science and Engineering
Vol. 3, Issue 3, 03000001 (2015)

A study on low emittance injector and undulator for PAL-XFEL

J. Hong¹, J.-H. Han¹, S.J. Park¹, Y.G. Jung¹, D.E. Kim¹, H.-S. Kang^1、*, and J. Pflueger²

Author Affiliations

¹Pohang Accelerator Laboratory, Pohang, Gyeongbuk 790-834, South Korea

²European XFEL, Notkestrasse 85, 22607 Hamburg, Germany

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DOI: 10.1017/hpl.2015.18 Cite this Article Set citation alerts

J. Hong, J.-H. Han, S.J. Park, Y.G. Jung, D.E. Kim, H.-S. Kang, J. Pflueger. A study on low emittance injector and undulator for PAL-XFEL[J]. High Power Laser Science and Engineering, 2015, 3(3): 03000001 Copy Citation Text

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