Design of 10-kV Vertical Double-Diffused Insulted-Gate Photoconductive Semiconductor Switch

Xinmei Wang; Huihui Wang; Lini Zhang; Pengchong Duan; Wanli Jia

doi:10.3788/LOP56.192501

Journals >Laser & Optoelectronics Progress >Volume 56 >Issue 19 >Page 192501 > Article

Laser & Optoelectronics Progress
Vol. 56, Issue 19, 192501 (2019)

Design of 10-kV Vertical Double-Diffused Insulted-Gate Photoconductive Semiconductor Switch

Xinmei Wang^1、*, Huihui Wang², Lini Zhang², Pengchong Duan², and Wanli Jia²

Author Affiliations

¹Faculty of Automation and Information Engineering, Xi'an University of Technology, Xi'an, Shaanxi 710048, China

²Faculty of Sciences, Xi'an University of Technology, Xi'an, Shaanxi 710048, China

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DOI: 10.3788/LOP56.192501 Cite this Article Set citation alerts

Xinmei Wang, Huihui Wang, Lini Zhang, Pengchong Duan, Wanli Jia. Design of 10-kV Vertical Double-Diffused Insulted-Gate Photoconductive Semiconductor Switch[J]. Laser & Optoelectronics Progress, 2019, 56(19): 192501 Copy Citation Text

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