• Journal of Infrared and Millimeter Waves
  • Vol. 40, Issue 5, 576 (2021)
Chuan SHEN1, Liao YANG1, Hui-Jun GUO1, Dan YANG1, Lu CHEN1、2、*, and Li HE1
Author Affiliations
  • 1Key Laboratory of Infrared Imaging Materials and Detectors,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,Shanghai 200083,China
  • 2Hangzhou Insitute for Advanced Study,University of Chinese Academy of Sciences,Hangzhou 310024,China
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    DOI: 10.11972/j.issn.1001-9014.2021.05.002 Cite this Article
    Chuan SHEN, Liao YANG, Hui-Jun GUO, Dan YANG, Lu CHEN, Li HE. Numerical simulation of high-operating-temperature MWIR HgCdTe APD detectors[J]. Journal of Infrared and Millimeter Waves, 2021, 40(5): 576 Copy Citation Text show less
    2-D structural model of HgCdTe APD
    Fig. 1. 2-D structural model of HgCdTe APD
    Comparison of dark current curves between experiment and numerical simulation of avalanche devices
    Fig. 2. Comparison of dark current curves between experiment and numerical simulation of avalanche devices
    Changes of the dark current density of APD devices at different temperatures
    Fig. 3. Changes of the dark current density of APD devices at different temperatures
    Different dark current mechanisms affecting devices at different operating temperatures (a)80K (b)100K,(c)150K,(d)200K
    Fig. 4. Different dark current mechanisms affecting devices at different operating temperatures (a)80K (b)100K,(c)150K,(d)200K
    The dark current density and gain of HgCdTe APD change with different Ni layer thickness(a)Dark current density(b)Gain
    Fig. 5. The dark current density and gain of HgCdTe APD change with different Ni layer thickness(a)Dark current density(b)Gain
    The dark current density and gain of HgCdTe APD change with different doping of Ni layer(a)Dark current density(b)Gain
    Fig. 6. The dark current density and gain of HgCdTe APD change with different doping of Ni layer(a)Dark current density(b)Gain
    参数N+层Ni层P层
    厚度(μm)22.9810
    掺杂浓度(cm-35×10171×10148×1015
    组分0.30.30.3
    Table 1. Device structure parameters involved in numerical simulation
    参数N+层Ni层P层
    厚度(μm)1~22~39~10
    掺杂浓度(cm-3≥5×1016≤1×1015≥3×1016
    组分0.30.30.3
    Table 2. Optimized Structural parameters of HOT HgCdTe APD
    Chuan SHEN, Liao YANG, Hui-Jun GUO, Dan YANG, Lu CHEN, Li HE. Numerical simulation of high-operating-temperature MWIR HgCdTe APD detectors[J]. Journal of Infrared and Millimeter Waves, 2021, 40(5): 576
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