Fig. 1. Schematic of experimental equipment. (a) LIDT test system with pump-probe technology; (b) A small vacuum system

Fig. 2. EDS measurements of 1 µm Al layer embedded in different depths of SiO₂ film. The horizontal coordinate is the thickness of the SiO₂ film layer, and the ordinate is the proportion of the quality of Al elements obtained by EDS. The measuring area is 50 μm×100 μm, the scanning time is 25 s, and the electron beam energy is 10 keV

Fig. 3. Distribution characteristics of Al particles in atmospheric and vacuum environments under different laser fluences

Fig. 4. Damage morphology of Al film deposited by electron beam evaporation

Fig. 5. Transient ejection characteristics of Al film at 90 ns in different environments captured by pump-probe image technology. (a) Atmospheric environment; (b) Vacuum environment

Fig. 6. Transient image of (a) Al and (b) W film ejection in 90 ns under vacuum environment

Fig. 7. Distribution characteristics of Al and W element on the receiving plate in atmospheric and vacuum environments

Table 1. Number of Al particles received by the receiving plate under different conditions

Table 2. Number of Al and W particles received by the receiving plate under different conditions