• Journal of Inorganic Materials
  • Vol. 34, Issue 1, 1 (2019)
Ren-Yan WANG, Lin GAN, Tian-You ZHAI, [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
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    DOI: 10.15541/jim20180171 Cite this Article
    Ren-Yan WANG, Lin GAN, Tian-You ZHAI, [in Chinese], [in Chinese], [in Chinese]. ReX2 (X=S, Se): A New Opportunity for Development of Two-dimensional Anisotropic Materials[J]. Journal of Inorganic Materials, 2019, 34(1): 1 Copy Citation Text show less
    (a) The model unitcell view of ReS2[33]; (b) Top view of the crystalline structure of distorted-1T phase of monolayer ReX2(Black balls represent Re atoms and yellow balls represent S or Se atoms); (c, d) Schematic images of 1T lattice symmetries and energy levels of d-orbital electrons induced by the crystal field[39,40]; (e) First-principles scalar relativistic projector augmented wave calculations of electronic band structures for bulk (top) and single-layer (down) ReSe2[50]; (f) Band structure of monolayer, trilayer and five-layer ReS2 by ab initio-calculations[51]
    . (a) The model unitcell view of ReS2[33]; (b) Top view of the crystalline structure of distorted-1T phase of monolayer ReX2(Black balls represent Re atoms and yellow balls represent S or Se atoms); (c, d) Schematic images of 1T lattice symmetries and energy levels of d-orbital electrons induced by the crystal field[39,40]; (e) First-principles scalar relativistic projector augmented wave calculations of electronic band structures for bulk (top) and single-layer (down) ReSe2[50]; (f) Band structure of monolayer, trilayer and five-layer ReS2 by ab initio-calculations[51]
    PL spectra of ReS2 flakes with different number of layers; (b) Integrated PL intensity as a function of number of layers (normalized to that of monolayer) in ReS2, MoS2, MoSe2, WS2 and WSe2[50]; Raman spectra recorded on (c) N-layer ReS2 and (d) N-layer ReSe2 in the parallel polarization configuration[58]; (e) Schematic for the process of oriented self assembly of ReS2 nanoscrolls[59]; (f) Schematic for the TIB of a single ReS2 nanowall[60]
    . PL spectra of ReS2 flakes with different number of layers; (b) Integrated PL intensity as a function of number of layers (normalized to that of monolayer) in ReS2, MoS2, MoSe2, WS2 and WSe2[50]; Raman spectra recorded on (c) N-layer ReS2 and (d) N-layer ReSe2 in the parallel polarization configuration[58]; (e) Schematic for the process of oriented self assembly of ReS2 nanoscrolls[59]; (f) Schematic for the TIB of a single ReS2 nanowall[60]
    (a) SEM image of ReS2 powders and TEM image of as-exfoliated ReS2 nanosheets with inset showing photograph of a typical dark-brown exfoliated ReS2 suspension in water; (b) High-resolution STEM image of as-exfoliated ReS2 nanosheets[70]; (c) Schematics for different density gradient ultracentrifugation ReS2 nanosheets through iDGU; (d) Atomic force microscopy image of solution-processed ReS2 following deposition on a Si wafer; (e) Raman spectrum of ReS2 nanosheets[63]
    . (a) SEM image of ReS2 powders and TEM image of as-exfoliated ReS2 nanosheets with inset showing photograph of a typical dark-brown exfoliated ReS2 suspension in water; (b) High-resolution STEM image of as-exfoliated ReS2 nanosheets[70]; (c) Schematics for different density gradient ultracentrifugation ReS2 nanosheets through iDGU; (d) Atomic force microscopy image of solution-processed ReS2 following deposition on a Si wafer; (e) Raman spectrum of ReS2 nanosheets[63]
    (a) Schematic diagram of synthesized ReS2 film by PVD; (b) Raman spectrum of ReS2 film ; (c) Optical photograph of grown ReS2 film on the SiO2/Si substrate with inset showing the AFM and TEM images[88]; (d) A picture of bare and as-grown ReS2 bilayer film on sapphire wafer by CVD; (e) Optical microscope image of the ReS2 hexagons[74]
    . (a) Schematic diagram of synthesized ReS2 film by PVD; (b) Raman spectrum of ReS2 film ; (c) Optical photograph of grown ReS2 film on the SiO2/Si substrate with inset showing the AFM and TEM images[88]; (d) A picture of bare and as-grown ReS2 bilayer film on sapphire wafer by CVD; (e) Optical microscope image of the ReS2 hexagons[74]
    (a) Schematic for the tellurium-assisted CVD growth approach; (b) Optical image of ReS2 after transferred onto SiO2/Si (300 nm) substrate with inset showing AFM image of ReS2 on mica substrate[77]; (c) Schematic of the CVD growth of ReSe2 in the confined reaction space and the surface reaction during the epitaxial growth of the ReSe2 atomic layer on mica; (d) Optical image of ReSe2 in A and B face[89]
    . (a) Schematic for the tellurium-assisted CVD growth approach; (b) Optical image of ReS2 after transferred onto SiO2/Si (300 nm) substrate with inset showing AFM image of ReS2 on mica substrate[77]; (c) Schematic of the CVD growth of ReSe2 in the confined reaction space and the surface reaction during the epitaxial growth of the ReSe2 atomic layer on mica; (d) Optical image of ReSe2 in A and B face[89]
    (a) A schematic illustrating the pump-probe experiment of few-layer ReS2 with inset showing optical image of few-layer ReS2; (b) Polarization-dependent absorption spectra of few-layer ReS2; (c) Corresponding spectral weights of Lorentzian contributions of X1 (blue dots) and X2(red dots). Yellow line represents the b-axis[122]; (d) Raman spectrum for bulk ReS2[128] and Low-frequency Raman spectroscopy of few layer ReS2[131]; (e) Unpolarized Raman spectra as a function of sample orientation angle; (f) High-magnification ADF-STEM image and corresponded polarization-and orientation-resolved Raman spectra[130]
    . (a) A schematic illustrating the pump-probe experiment of few-layer ReS2 with inset showing optical image of few-layer ReS2; (b) Polarization-dependent absorption spectra of few-layer ReS2; (c) Corresponding spectral weights of Lorentzian contributions of X1 (blue dots) and X2(red dots). Yellow line represents the b-axis[122]; (d) Raman spectrum for bulk ReS2[128] and Low-frequency Raman spectroscopy of few layer ReS2[131]; (e) Unpolarized Raman spectra as a function of sample orientation angle; (f) High-magnification ADF-STEM image and corresponded polarization-and orientation-resolved Raman spectra[130]
    (a) Optical microscope image of ReS2 four probe transistor; (b) The magnified ADF images taken from the sample in (a); (c) The direction-dependent I-V characteristics with inset showing nonlinear I-V behavior indicate the Schottky Au/ReS2 contacts; (d) The direction-dependent transfer characteristics[137]; (e) Transfer curves of anisotropic ReS2 FETs along two sides with top inset showing optical image of the devices (Scale bar, 10 μm) and low inset showing the 4-probe resistance of the same devices. (f) Normalized field-effect mobility of a six-layer device with inset showing the optical image of the device[51]; (g) Angle-dependent transfer curves of ReS1.23Se0.77 alloy device with inset showing optical image of ReS2 device[76]
    . (a) Optical microscope image of ReS2 four probe transistor; (b) The magnified ADF images taken from the sample in (a); (c) The direction-dependent I-V characteristics with inset showing nonlinear I-V behavior indicate the Schottky Au/ReS2 contacts; (d) The direction-dependent transfer characteristics[137]; (e) Transfer curves of anisotropic ReS2 FETs along two sides with top inset showing optical image of the devices (Scale bar, 10 μm) and low inset showing the 4-probe resistance of the same devices. (f) Normalized field-effect mobility of a six-layer device with inset showing the optical image of the device[51]; (g) Angle-dependent transfer curves of ReS1.23Se0.77 alloy device with inset showing optical image of ReS2 device[76]
    (a) The photocurrent of ReS2 change as a function of drain bias under different polarization light illuminations; (b) The change of the photocurrent under different drain biases plotted as a function of polarization angle[112]; (c) Photocurrent response of ReS1.06Se0.94 alloy device under light on and off irradiation, and under light with different polarization direction; (d) Polar plots for the photocurrent with respect to the polarization angle of the incident light[76]; (e) Schematic structure of ReSe2 photodetectors; (f) The SEM image and polarization-dependent photocurrent mapping of the device[15]
    . (a) The photocurrent of ReS2 change as a function of drain bias under different polarization light illuminations; (b) The change of the photocurrent under different drain biases plotted as a function of polarization angle[112]; (c) Photocurrent response of ReS1.06Se0.94 alloy device under light on and off irradiation, and under light with different polarization direction; (d) Polar plots for the photocurrent with respect to the polarization angle of the incident light[76]; (e) Schematic structure of ReSe2 photodetectors; (f) The SEM image and polarization-dependent photocurrent mapping of the device[15]
    (a) Optical microscopy image of an exfoliated ReS2 ?ake; (b) Through-plane TDTR data at two modulation frequencies; (c) In-plane TDTR data at f = 1.1 MHz and time delay of -50 ps. The dashed lines are the intensity profile of the laser beam; (d) 2D beam-offset scan of the TDTR signal; (e) In-plane thermal conductivity of exfoliated ReS2 ?akes as a function of thickness[151]
    . (a) Optical microscopy image of an exfoliated ReS2 ?ake; (b) Through-plane TDTR data at two modulation frequencies; (c) In-plane TDTR data at f = 1.1 MHz and time delay of -50 ps. The dashed lines are the intensity profile of the laser beam; (d) 2D beam-offset scan of the TDTR signal; (e) In-plane thermal conductivity of exfoliated ReS2 ?akes as a function of thickness[151]
    Materialsa/nmb/nmc/nmα/(°)β/(°)γ/(°)V/nm3
    ReS20.64170.65100.6461121.1088.38106.470.21930
    ReSe20.66030.67170.671891.87104.93118.950.24753
    Table 1. Original unit-cell lattice parameters of ReS2 and ReSe2[36,37]
    SymmetryBulk/cm-1Monolayer/cm-1Origin of phonon mode
    Ag140.3139.2Out-of-plane vibrations of Re atoms
    Ag145.9145.3Out-of-plane vibrations of Re atoms
    Eg153.1153.6In-plane vibrations of Re atoms
    Eg163.6163.6In-plane vibrations of Re atoms
    Eg217.2217.7In-plane vibrations of Re atoms
    Eg237.1237.7In-plane vibrations of Re atoms
    Cp278.3278.3In- and out-of-plane vibration of Re and S atoms
    Cp284.2284.7In- and out-of-plane vibration of Re and S atoms
    Eg307.8307.8In-plane vibrations of S atoms
    Eg311.0311.0In-plane vibrations of S atoms
    Cp320.6320.6In- and out-of-plane vibration of S atoms
    Cp324.9324.9In- and out-of-plane vibration of S atoms
    Cp348.8348.8In- and out-of-plane vibration of S atoms
    Cp368.9369.5In- and out-of-plane vibration of S atoms
    Cp377.9377.4In- and out-of-plane vibration of S atoms
    Cp407.3408.3In- and out-of-plane vibration of S atoms
    Ag418.7419.3Out-of-plane vibrations of S atoms
    Ag438.0437.5Out-of-plane vibrations of S atoms
    Table 2. The 18 Raman active frequencies in bulk and monolayer ReS2 under 633 nm solid state laser excitation[35]
    Ren-Yan WANG, Lin GAN, Tian-You ZHAI, [in Chinese], [in Chinese], [in Chinese]. ReX2 (X=S, Se): A New Opportunity for Development of Two-dimensional Anisotropic Materials[J]. Journal of Inorganic Materials, 2019, 34(1): 1
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