Influence of Chemical Polishing on Performances of Silicon Heterojunction Solar Cells

Yuanjian Jiang; Xiaodan Zhang; Ying Zhao

doi:10.3788/LOP56.062402

Journals >Laser & Optoelectronics Progress >Volume 56 >Issue 6 >Page 062402 > Article

Laser & Optoelectronics Progress
Vol. 56, Issue 6, 062402 (2019)

Influence of Chemical Polishing on Performances of Silicon Heterojunction Solar Cells

Yuanjian Jiang^1、*, Xiaodan Zhang², and Ying Zhao²

Author Affiliations

¹ College of Physics and Electronic Engineering, Heze University, Heze, Shandong 274015, China

² Key Laboratory of Optoelectronic Thin Film Devices and Technology of Tianjin City, Institute of Photo-Electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China

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DOI: 10.3788/LOP56.062402 Cite this Article Set citation alerts

Yuanjian Jiang, Xiaodan Zhang, Ying Zhao. Influence of Chemical Polishing on Performances of Silicon Heterojunction Solar Cells[J]. Laser & Optoelectronics Progress, 2019, 56(6): 062402 Copy Citation Text

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Fig. 1. Structural diagram of SHJ solar cell

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Fig. 2. SEM images of pyramid profile. (a) Before isotropic etching; (b) after isotropic etching

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$SEM images of silicon substrates textured by NaOH solution with mass fraction of 2% after different CP133 polishing time treatments. (a) 30 s; (b) 40 s; (c) 50 s; (d) 60 s; (e) 70 s$

Fig. 3. SEM images of silicon substrates textured by NaOH solution with mass fraction of 2% after different CP133 polishing time treatments. (a) 30 s; (b) 40 s; (c) 50 s; (d) 60 s; (e) 70 s

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Fig. 4. Performance of solar cells as a function of chemical polishing time [w(NaOH)=2%]

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Fig. 5. Effect of CP133 polishing time on external quantum efficiency (EQE) of solar cells [w(NaOH)=2%]

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$SEM images of silicon substrates textured by NaOH solution with mass fraction of 1% after different polishing time treatments. (a) 20 s; (b) 30 s; (c) 40 s$

Fig. 6. SEM images of silicon substrates textured by NaOH solution with mass fraction of 1% after different polishing time treatments. (a) 20 s; (b) 30 s; (c) 40 s

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Fig. 7. Performance of solar cells as a function of polishing time [w(NaOH)=1%]

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Fig. 8. SEM images of silicon substrates textured by NaOH solutions of different concentrations after 30 s CP133 polishing treatment. (a) 2%; (b) 1%

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Fig. 9. EQE curves for cells with optimal conversion efficiency

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Lifetime as-deposited /μs	$\begin{matrix} V_{oc ⁃ imp}^{deposite} \end{matrix}$ /V	Lifetime afterannealing /μs	$\begin{matrix} V_{oc ⁃ imp}^{anneal} \end{matrix}$ /V
118	0.668	181	0.684
110	0.665	162	0.68

Table 1. Minority carrier lifetime and corresponding Voc-imp of texturing silicon substrates in treatment 1

Lifetime as-deposited /μs	$\begin{matrix} V_{oc ⁃ imp}^{deposite} \end{matrix}$ /V	Lifetime afterannealing /μs	$\begin{matrix} V_{oc ⁃ imp}^{anneal} \end{matrix}$ /V
677.8	0.72	1399.86	0.733
495.42	0.712	1137.94	0.731

Table 2. Minority carrier lifetime and corresponding Voc-imp of texturing silicon substrates in treatment 2

CP polishing time /s	Lifetime as-deposited /μs	$\begin{matrix} V_{oc ⁃ imp}^{deposite} \end{matrix}$ /V	Lifetime after annealing /μs	$\begin{matrix} V_{oc ⁃ imp}^{anneal} \end{matrix}$ /V
40	143.44	0.653	246.07	0.677
50	158.32	0.656	262.05	0.678
60	226.37	0.673	550.56	0.703

Table 3. Effect of CP133 polishing time on minority carrier lifetime and corresponding Voc-imp of texturing silicon substrates [w(NaOH)=2%]

CP polishingtime /s	Lifetime afterannealing /μs	$\begin{matrix} V_{oc ⁃ imp}^{anneal} \end{matrix}$ /V
20	83.23	0.643
30	238.57	0.676
40	116.29	0.648
50	53.17	0.626

Table 4. Minority carrier lifetime and corresponding Voc-imp of texturing silicon substrates in treatment 3 [w(NaOH)=1%]

Concentration of NaOH /%	CP polishing time /s	$\begin{matrix} V_{oc}^{smoot h ing} \end{matrix}$ /V	F_f /%	η /%	J_sc-QE /(mA·cm^-2)
1	30	0.656	68.8	16.5	36.5
2	60	0.678	65.8	14.9	33.5

Table 5. Optimal performance parameters of SHJ solar cells for textured substrates prepared at different concentrations of NaOH solutions

Yuanjian Jiang, Xiaodan Zhang, Ying Zhao. Influence of Chemical Polishing on Performances of Silicon Heterojunction Solar Cells[J]. Laser & Optoelectronics Progress, 2019, 56(6): 062402

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